What is nanoimprint lithography used for?

Nanoimprint lithography has been used to fabricate devices for electrical, optical, photonic and biological applications. For electronics devices, NIL has been used to fabricate MOSFET, O-TFT, single electron memory.

How nanoimprint lithography conducted?

Nanoimprint lithography (NIL) is a simple mechanical lithography technique involving a stamp, or a template, pressed against a deformable imprint resist layer deposited on a substrate to make the contours of the template.

Who invented nanoimprint lithography?

Professor Stephen Chou
NIL was originally introduced in 1996, when Princeton Professor Stephen Chou invented the technology and coined the phrase “nanoimprint lithography.” Three years later, Chou founded Nanonex, a pioneer developer of NIL tools.

How does nanolithography work?

How Does Nanolithography Work? In general, the majority of nanolithography methods engage the properties of light or electrons to produce patterns in a substrate. This patterning can be targeted by adding masks onto the photoresist so as to shield particular regions from the incoming light.

Who is the leading equipment supplier for nanoimprint lithography?

EVG is the market-leading equipment supplier for nanoimprint lithography (NIL). Pioneering this non-conventional lithography technique for many years, EVG mastered NIL and has implemented it in volume production on ever-increasing substrate sizes.

How are resist patterns defined in nanoimprint lithography?

In a typical process, photoresist patterns are first defined using photolithography. A polydimethylsiloxane ( PDMS) elastomer stamp is subsequently replica molded from the resist patterns. Further, a single-step nanoimprint directly molds thin film materials into desired device geometries under pressure at elevated temperatures.

How are nil patterns used in nanopatterning?

Nanoimprint lithography (NIL) is a new way of nanopatterning and a revolutionary solution to nanomanufacturing. NIL patterns nanostructures by the physical deformation of a deformable material using a mold.

Which is the best technology for imprint lithography?

SCIL (substrate conformal imprint lithography) technology is particularly suitable for high demand imprint processes. Here a soft stamp is used in combination with a hard but flexible glass carrier, thereby achieving superior evenness of contact and exceptionally high fidelity in pattern transfer.